The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Mar. 17, 2020
Applicant:
Gigaphoton Inc., Tochigi, JP;
Inventors:
Assignee:
Gigaphoton Inc., Tochigi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/06 (2006.01); G02B 5/08 (2006.01); G02B 5/10 (2006.01); H05G 2/00 (2006.01); G02B 27/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G21K 1/06 (2013.01); G02B 5/0891 (2013.01); G02B 5/10 (2013.01); G02B 27/0006 (2013.01); G03F 7/70166 (2013.01); H05G 2/005 (2013.01); H05G 2/006 (2013.01); H05G 2/008 (2013.01); G21K 2201/064 (2013.01); G21K 2201/065 (2013.01);
Abstract
An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.