The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Nov. 29, 2018
Industrial Technology Research Institute, Hsinchu, TW;
Kuo-Hsin Lin, Hsinchu, TW;
Li-Duan Tsai, Hsinchu, TW;
Wen-Hsuan Chao, Zhunan Township, TW;
Yu-Ming Lin, Tainan, TW;
Pin-Hsin Yang, Tainan, TW;
Hsiao-Chun Huang, Taoyuan, TW;
Chiu-Ping Huang, Taoyuan, TW;
Jiunn-Nan Lin, Taoyuan, TW;
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Hsinchu, TW;
Abstract
A method for manufacturing catalyst material is provided, which includes putting an M' target and an M″ target into a nitrogen-containing atmosphere, in which M′ is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, and M″ is Nb, Ta, or a combination thereof. Powers are provided to the M′ target and the M″ target, respectively. Providing ions to bombard the M′ target and the M″ target to sputtering deposit M′M″Non a substrate, wherein 0.7≤a≤1.7, 0.3≤b≤1.3, and a+b=2, wherein M′M″Nis a cubic crystal system.