The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 05, 2021

Filed:

May. 22, 2018
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Hideo Morishita, Tokyo, JP;

Teruo Kohashi, Tokyo, JP;

Toshihide Agemura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/244 (2006.01); G01N 23/2251 (2018.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/244 (2013.01); G01N 23/2251 (2013.01); H01J 37/22 (2013.01); G01N 2223/07 (2013.01); G01N 2223/507 (2013.01); H01J 2237/24557 (2013.01);
Abstract

A spin polarimeter includes: a particle beam source or a photon beam source that is a probe for a sample; a sample chamber in which the sample is accommodated; a spin detector that includes a target to be irradiated with an electron generated from the sample by a particle beam or a photon beam from the probe, and a target chamber in which the target is accommodated, and is configured to detect a spin of the sample by detecting an electron scattered on the target; a first exhaust system that is configured to exhaust the sample chamber; a second exhaust system that is configured to exhaust the target chamber; and an orifice that is disposed between the target chamber and the sample chamber.


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