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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11138361 B1

PDFFull Text
Date of Patent:
Oct. 05, 2021

Filed:

Nov. 25, 2019

Integrated circuit and system of manufacturing the same

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Yu-Jung Chang, Zhubei, TW;

Chin-Chang Hsu, Banqiao, TW;

Hsien-Hsin Sean Lee, Duluth, GA (US);

Wen-Ju Yang, Hsinchu, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;

Attorney:

Hauptman Ham, LLP

Primary Examiner:

Sonya McCall-Shepard

Int. Cl.
CPC ...
H01L 27/118 (2006.01); H01L 21/8234 (2006.01); H01L 21/28 (2006.01); H01L 27/088 (2006.01); H01L 29/40 (2006.01); H01L 29/49 (2006.01); H01L 27/02 (2006.01); G06F 30/392 (2020.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); H01L 21/28008 (2013.01); H01L 21/823431 (2013.01); H01L 21/823437 (2013.01); H01L 27/0886 (2013.01); H01L 27/11807 (2013.01); H01L 29/401 (2013.01); H01L 29/4916 (2013.01); H01L 27/0207 (2013.01); H01L 27/088 (2013.01);
Abstract

An integrated circuit includes a first and second set of gate structures. A center of each of the first set of gate structures is separated from a center of an adjacent gate of the first set of gate structures in a first direction by a first pitch. A center of each of the second set of gate structures is separated from a center of an adjacent gate of the second set of gate structures in the first direction by the first pitch. The first and second set of gate structures extend in a second direction. A gate of the first set of gate structures is aligned in the second direction with a corresponding gate of the second set of gate structures. The gate of the first set of gate structures is separated from the corresponding gate of second set of gate structures in the second direction by a first distance.

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