The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2021
Filed:
Sep. 08, 2017
Asml Netherlands B.v., Veldhoven, NL;
Marcel Nicolaas Jacobus Van Kervinck, The Hague, NL;
Vincent Sylvester Kuiper, The Hague, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of creating electronic devices such as semiconductor chips using a maskless lithographic exposure system such as a charged particle multi-beamlet lithography system (A-D). The maskless lithographic exposure system comprises a lithography subsystem () including a maskless pattern writer such as a charged particle multi-beamlet lithography machine () or ebeam machine. The method comprises introducing unique chip design data () or information related thereto into pattern data comprising common chip design data before streaming the pattern data to the maskless pattern writer.