The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2021
Filed:
Jul. 29, 2020
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Dongcheng Wu, Shanghai, CN;
Maocheng Fan, Shanghai, CN;
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Abstract
The disclosure provides a dual-port static random access memory cell layout structure, including a pull-down transistor layout structure, a first and a second pass transistor layout structure. Each of them includes an active region pattern and a polysilicon pattern; and contact hole patterns. The active region pattern of the pull-down transistor layout structure and the first pass transistor layout structure are connected together, and share the contact hole pattern at one end. The active region pattern of the pull-down transistor layout structure and the second pass transistor layout structure are connected together, and share the contact hole pattern at the other end. The disclosure optimizes the dual-port static random access memory cell layout structure, improves the influence of the optical fillet effect on device matching, strengthens the performance including read-write crosstalk of the pull-down transistor under the situation of the same area, and increases the read current.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile