The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2021

Filed:

Oct. 31, 2016
Applicant:

Siemens Industry Software Inc., Plano, TX (US);

Inventors:

Jonathan Makem, Cambridge, GB;

Nilanjan Mukherjee, Cincinnati, OH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/23 (2020.01); G06F 30/12 (2020.01);
U.S. Cl.
CPC ...
G06F 30/23 (2020.01); G06F 30/12 (2020.01);
Abstract

A system and method is provided for element quality improvement in three-dimensional (3D) quadrilateral-dominant surface meshes. The system may include a processor configured to collapse a first plurality of edges of a plurality of quadrilateral elements that form a surface mesh of a 3D model, which edges have lengths that are shorter than a predetermined fraction of a minimum element edge length (MEL). Further, the processor may also move nodes connected to at least some of a second plurality of edges of the plurality of quadrilateral elements so as to have lengths that are at least the MEL. Also, the processor may adjust included angles and the warp of elements to be within predetermined limits. Further, the processor may collapse in the mesh all remaining edges of the plurality of quadrilateral elements that are shorter than the MEL to produce a modified surface mesh in which all quadrilaterals in the modified mesh have edge lengths that are at least the MEL.


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