The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2021
Filed:
Mar. 15, 2019
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Eric Eva, Aalen, DE;
Assignee:
CARL ZEISS SMT GMBH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); C22C 47/14 (2006.01); C22C 47/04 (2006.01); C22C 49/02 (2006.01); C22C 49/06 (2006.01); C22C 32/00 (2006.01); G02B 1/10 (2015.01);
U.S. Cl.
CPC ...
G03F 7/702 (2013.01); C22C 32/0021 (2013.01); C22C 47/04 (2013.01); C22C 47/14 (2013.01); C22C 49/02 (2013.01); C22C 49/06 (2013.01); G02B 1/10 (2013.01); G03F 7/7015 (2013.01); G03F 7/70033 (2013.01); G03F 7/70075 (2013.01); G03F 7/7095 (2013.01); G03F 7/70116 (2013.01); B22F 2998/10 (2013.01); B22F 2999/00 (2013.01);
Abstract
A component for a mirror array for EUV lithography, particularly for use in faceted mirrors in illumination systems of EUV lithography devices. A component () for a mirror array for EUV lithography is proposed which is at least partially made from a composite material including matrix material () that contains copper and/or aluminium, and reinforcing material in the form of fibers (). The composite material also includes particles () that consist of one or more of the materials from the group: graphite, adamantine carbon, and ceramic.