The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2021

Filed:

Dec. 23, 2020
Applicant:

Ibiden Co., Ltd., Gifu, JP;

Inventors:

Yasuki Kimishima, Ogaki, JP;

Satoru Kawai, Ogaki, JP;

Assignee:

IBIDEN CO., LTD., Ogaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/11 (2006.01); H05K 3/00 (2006.01); H05K 1/03 (2006.01); H05K 3/06 (2006.01); H05K 3/42 (2006.01);
U.S. Cl.
CPC ...
H05K 1/116 (2013.01); H05K 3/0038 (2013.01); H05K 3/0055 (2013.01); H05K 1/0366 (2013.01); H05K 3/0094 (2013.01); H05K 3/06 (2013.01); H05K 3/428 (2013.01); H05K 2201/029 (2013.01); H05K 2201/0769 (2013.01); H05K 2201/0959 (2013.01); H05K 2201/09581 (2013.01); H05K 2201/09609 (2013.01); H05K 2201/09636 (2013.01); H05K 2203/107 (2013.01);
Abstract

A wiring substrate includes an insulating layer having through holes, a first conductor layer formed on first surface of the insulating layer, a second conductor layer formed on second surface of the insulting layer on the opposite side, and interlayer connection conductors formed in the through holes through the insulating layer and connecting the first and second conductor layers. The insulating layer is formed such that the though holes include first and second groups of through holes and that the through holes in the second group have inner walls covered with non-conductive resin, and the interlayer conductors includes first interlayer conductors each including a plating film formed in the first group of through holes, and second interlayer conductors each including a plating film formed in the second group of through holes such that minimum distance between the second interlayer conductors is smaller than minimum distance between the first interlayer conductors.


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