The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2021
Filed:
Feb. 25, 2018
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Jagdish Chandra Saraswatula, Puttaparthi, IN;
Martin Plihal, Pleasanton, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/2251 (2018.01); H01J 37/28 (2006.01); G06T 7/00 (2017.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); G03F 7/7065 (2013.01); G06T 7/0004 (2013.01); G06T 7/0006 (2013.01); H01J 37/28 (2013.01); G01N 2223/6116 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01); H01J 2237/2817 (2013.01);
Abstract
Defect location accuracy can be increased using shape based grouping with pattern-based defect centering. Design based grouping of defects on a wafer can be performed. A spatial distribution of the defects around at least one structure on the wafer, such as a predicted hot spot, can be determined. At least one design based defect property for a location around the structure can be determined. The defects within an x-direction threshold and a y-direction threshold of the structure may be prioritized.