The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2021
Filed:
Feb. 11, 2019
Applied Materials, Inc., Santa Clara, CA (US);
Viachslav Babayan, Sunnyvale, CA (US);
Douglas A. Buchberger, Jr., Livermore, CA (US);
Qiwei Liang, Fremont, CA (US);
Ludovic Godet, Sunnyvale, CA (US);
Srinivas D. Nemani, Sunnyvale, CA (US);
Daniel J. Woodruff, Kalispell, MT (US);
Randy Harris, Kalispell, MT (US);
Robert B. Moore, Bigfork, MT (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.