The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2021

Filed:

Aug. 03, 2016
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Gosse Charles De Vries, Veldhoven, NL;

Han-Kwang Nienhuys, Utrecht, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); G03F 7/20 (2006.01); G02B 5/18 (2006.01); H01S 3/09 (2006.01); G02B 6/293 (2006.01); G02B 6/00 (2006.01);
U.S. Cl.
CPC ...
G02B 27/1093 (2013.01); G02B 5/1838 (2013.01); G02B 5/1857 (2013.01); G02B 5/1861 (2013.01); G02B 6/00 (2013.01); G02B 6/29313 (2013.01); G02B 6/29314 (2013.01); G02B 27/1086 (2013.01); G03F 7/70025 (2013.01); G03F 7/70033 (2013.01); G03F 7/7055 (2013.01); G03F 7/70158 (2013.01); G03F 7/70208 (2013.01); G03F 7/70316 (2013.01); G03F 7/70566 (2013.01); G03F 7/70991 (2013.01); H01S 3/0903 (2013.01);
Abstract

A beam-splitting apparatus arranged to receive an input radiation beam and split the input radiation beam into a plurality of output radiation beams. The beam-splitting apparatus comprising a plurality of reflective diffraction gratings arranged to receive a radiation beam and configured to form a diffraction pattern comprising a plurality of diffraction orders, at least some of the reflective diffraction gratings being arranged to receive a 0diffraction order formed at another of the reflective diffraction gratings. The reflective diffraction gratings are arranged such that the optical path of each output radiation beam includes no more than one instance of a diffraction order which is not a 0diffraction order.


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