The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2021

Filed:

Dec. 03, 2018
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Surendra Babu Anantharaman, Hsinchu, TW;

Wen-Cheng Yang, Hsinchu, TW;

Chung-En Kao, Toufen Township, TW;

Victor Y. Lu, Foster City, CA (US);

Wei Chin, Pingtung, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F04B 37/08 (2006.01);
U.S. Cl.
CPC ...
F04B 37/08 (2013.01); F04B 37/085 (2013.01);
Abstract

Cryogenic pump apparatuses include nanostructure material to achieve an ultra-high vacuum level. The nanostructure material can be mixed with either an adsorbent material or a fixed glue layer which is utilized to fix the adsorbent material. The nanostructure material's good thermal conductivity and adsorption properties help to lower working temperature and extend regeneration cycle of the cryogenic pumps.


Find Patent Forward Citations

Anantharaman, Surendra. (2021). Ultra high vacuum cryogenic pumping apparatus with nanostructure material (U.S. Patent No. 11111910). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11111910

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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