The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2021

Filed:

Feb. 27, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Yongan Xu, Santa Clara, CA (US);

Chien-An Chen, San Jose, CA (US);

Ludovic Godet, Sunnyvale, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 17/36 (2006.01); C03C 17/38 (2006.01);
U.S. Cl.
CPC ...
C03C 17/3639 (2013.01); C03C 17/3626 (2013.01); C03C 17/3636 (2013.01); C03C 17/3655 (2013.01); C03C 17/38 (2013.01); C03C 2217/213 (2013.01);
Abstract

Aspects of the present disclosure relate generally to methods and apparatus of processing transparent substrates, such as glass substrates. In one implementation, a film stack for optical devices includes a glass substrate including a first surface and a second surface. The film stack includes a device function layer formed on the first surface, a hard mask layer formed on the device function layer, and a substrate recognition layer formed on the hard mask layer. The hard mask layer includes one or more of chromium, ruthenium, or titanium nitride. The film stack includes a backside layer formed on the second surface. The backside layer formed on the second surface includes one or more of a conductive layer or an oxide layer.


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