The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2021
Filed:
Jun. 11, 2019
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Hong-Ting Lu, Taichung, TW;
Han-Wen Liao, Taichung, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/02 (2006.01); C25F 3/12 (2006.01); H01L 21/306 (2006.01); H01L 21/3063 (2006.01); H01L 21/3213 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); H01L 29/165 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6708 (2013.01); C25F 3/02 (2013.01); C25F 3/12 (2013.01); H01L 21/306 (2013.01); H01L 21/3063 (2013.01); H01L 21/30604 (2013.01); H01L 21/30608 (2013.01); H01L 21/32133 (2013.01); H01L 21/32134 (2013.01); H01L 21/687 (2013.01); H01L 29/66545 (2013.01);
Abstract
A method includes dispensing a chemical solution including charged ions onto a semiconductor substrate to chemically etch a target structure on the semiconductor substrate, and applying an electric field on the semiconductor substrate during dispensing the chemical solution on the semiconductor substrate, such that the charged ions in the chemical solution are moved in response to the electric field.