The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2021

Filed:

Oct. 19, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Takashi Kamio, Nirasaki, JP;

Toshiaki Fujisato, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); C23C 16/34 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); C23C 16/34 (2013.01); C23C 16/45502 (2013.01); C23C 16/45517 (2013.01); C23C 16/45544 (2013.01); C23C 16/45557 (2013.01); C23C 16/45565 (2013.01); C23C 16/45591 (2013.01); C23C 16/52 (2013.01);
Abstract

There is provided a processing apparatus including a stage disposed inside a chamber, and a cover member provided in an outer edge portion of the stage and configured to partition an interior of the chamber into a processing space above the stage and a bottom space below the stage. The cover member includes a first protrusion portion configured to make surface-to-surface contact with a surface of the stage, a second protrusion portion spaced apart from the first protrusion portion and configured to make surface-to-surface contact with the surface of the stage, and an exhaust path provided between the first protrusion portion and the second protrusion portion and configured to exhaust a gas from a buffer space formed by the cover member and the stage.


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