The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2021
Filed:
Jul. 15, 2019
Applicant:
National Sun Yat-sen University, Kaohsiung, TW;
Inventors:
Ting-Chang Chang, Kaohsiung, TW;
Kuan-Chang Chang, Kaohsiung, TW;
Chih-Cheng Shih, Kaohsiung, TW;
Chih-Hung Pan, Kaohsiung, TW;
Assignee:
NATIONAL SUN YAT-SEN UNIVERSITY KZ, Kaohsiung, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/322 (2006.01); H01L 21/26 (2006.01);
U.S. Cl.
CPC ...
H01L 21/322 (2013.01); H01L 21/26 (2013.01);
Abstract
A method for reducing defects of an electronic component using a supercritical fluid includes recrystallizing and rearranging grains in the electronic component by introducing the supercritical fluid doped with HS together with an electromagnetic wave into a cavity. The cavity has a temperature above a critical temperature of the supercritical fluid and a pressure above a critical pressure of the supercritical fluid.