The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2021
Filed:
Oct. 07, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kenneth S. Collins, San Jose, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Leonid Dorf, San Jose, CA (US);
Yang Yang, Los Gatos, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3255 (2013.01); H01J 37/3233 (2013.01); H01J 37/32357 (2013.01); H01J 37/32422 (2013.01); H01L 21/67213 (2013.01); H01L 2224/85017 (2013.01);
Abstract
A method of etching uses an overhead electron beam source that generates an ion-ion plasma for performing an atomic layer etch process.