The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2021
Filed:
Apr. 11, 2017
Advantest Corporation, Tokyo, JP;
Youichi Shimizu, Tochigi, JP;
Hitoshi Tanaka, Tochigi, JP;
ADVANTEST CORPORATION, Tokyo, JP;
Abstract
A multi-beam exposure device reducing variations of electron beam optical systems for electron beams, and preventing vacuum leakage. An exposure device is provided, including: a body tube depressurized to produce a vacuum state therein; multiple charged particle beam sources provided in the body tube, and emitting multiple charged particle beams in a direction of extension of the body tube; multiple electromagnetic optical elements, each provided corresponding to one of the multiple charged particle beams in the body tube, and controlling the one of the multiple charged particle beams; first and second partition walls arranged separately from each other in the direction of extension in the body tube, and forming a non-vacuum space between at least parts of the first and second partition walls; and a supporting unit provided in the body tube, and supporting the multiple electromagnetic optical elements for positioning of the multiple electromagnetic optical elements.