The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2021

Filed:

Mar. 29, 2018
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Frank Weigl, Holzheim, DE;

Konstantin Forcht, Aalen, DE;

Horst Feldermann, Aalen, DE;

Assignee:

CARL ZEISS SMT GMBH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 (2006.01); G02B 5/08 (2006.01); G02B 21/16 (2006.01); G03F 7/20 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0891 (2013.01); G02B 5/0858 (2013.01); G02B 21/16 (2013.01); G03F 7/7015 (2013.01); G21K 1/062 (2013.01);
Abstract

A reflective optical element, in particular for a DUV or VUV operating wavelength range, includes a substrate, a dielectric layer system and a metallic coating between the substrate and the dielectric layer system. The dielectric layer system () includes a layer (L) of material having a lower refractive index nat the operating wavelength, a layer (H) of material having a higher refractive index nat the operating wavelength and a layer (M) of material having a refractive index nat the operating wavelength, where n<n<n. The layer (M) is arranged at at least one transition from a layer (L) to a layer (H) and/or from a layer (H) to a layer (L). The dielectric layer system has a four-layer sequence of (LMHM)m or (HMLM)m, where m is equal to the number of four-layer sequences in the dielectric layer system.


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