The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2021

Filed:

Dec. 12, 2018
Applicant:

Globalfoundries Singapore Pte. Ltd., Singapore, SG;

Inventors:

Eng Huat Toh, Singapore, SG;

Shyue Seng Tan, Singapore, SG;

Elgin Kiok Boone Quek, Singapore, SG;

Danny Pak-Chum Shum, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/74 (2006.01); H01L 27/102 (2006.01); G11C 11/39 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1027 (2013.01); G11C 11/39 (2013.01); H01L 29/66363 (2013.01); H01L 29/74 (2013.01);
Abstract

Devices and methods for forming a device are presented. The device includes a substrate having a well of a first polarity type and a thyristor-based memory cell. The thyristor-based memory cell includes at least a first region of a second polarity type adjacent to the well, a gate which serves as a second word line disposed on the substrate, at least a first layer of the first polarity type disposed adjacent to the first region of the second polarity type and adjacent to the gate, and at least a heavily doped first layer of the second polarity type disposed on the first layer of the first polarity type and adjacent to the gate. At least the heavily doped first layer of the second polarity type is self-aligned with side of the gate.


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