The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2021

Filed:

Feb. 19, 2020
Applicant:

Qoniac Gmbh, Dresden, DE;

Inventors:

Stefan Buhl, Dresden, DE;

Philip Groeger, Dresden, DE;

Patrick Lomtscher, Dresden, DE;

Assignee:

Qoniac GmbH, Dresden, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/32 (2020.01); G03F 7/20 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G01N 21/9505 (2013.01); G03F 7/70625 (2013.01); G06F 30/32 (2020.01);
Abstract

Critical dimension values can be obtained from wafer structures at predefined measurement sites. Coefficients of a preset model and another model with a different term are determined using critical dimension values from the measurement sites. The models approximate the critical dimension values, the process parameters and/or correction values of the process parameters as a function of at least two position coordinates. An updated model is selected from the models based on a criterion weighting the residuals between approximated critical dimension values, the number of terms of the model and/or the order or the terms of the model.


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