The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Oct. 02, 2020
Ebara Corporation, Tokyo, JP;
Keisuke Matsushima, Tokyo, JP;
Kazutomo Miyazaki, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
An exhaust system capable of diluting a hydrogen gas to a concentration below the lower explosive limit without requiring a large amount of dilution gas while preventing an increase in a pressure of an exhaust gas in a buffer tank is disclosed. The exhaust system performs, when a main valve disposed in an exhaust line is closed, an initial exhaust operation in which a gas heavier than the hydrogen gas is discharged from a lower part of a buffer tank while an inlet valve disposed in an inlet line and a first outlet valve disposed in an outlet line are opened to introduce the exhaust gas from an equipment in a tangential direction of a buffer tank. Next, the exhaust system performs a hydrogen-gas discharge operation in which the inlet valve and the first outlet valve are closed, and the a bypass valve disposed in a bypass line and the second outlet valve disposed in a hydrogen-gas discharge line are opened to discharge the hydrogen gas stayed in an upper part of the buffer tank while flowing the exhaust gas into a bypass line.