The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2021
Filed:
Jun. 26, 2019
Micron Technology, Inc., Boise, ID (US);
Jaydip Guha, Boise, ID (US);
Saurabh Keshav, Boise, ID (US);
Srinivas Pulugurtha, Boise, ID (US);
Mohd Kamran Akhtar, Boise, ID (US);
James B. Franek, Boise, ID (US);
Alex J. Schrinsky, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Apparatus, such as electronic devices and structures thereof, include at least one doped surface of a base (e.g., semiconductor) material. A dopant of the at least one doped surface is concentrated along the surface, defining a thickness, on or in the base material, not exceeding about one atomic layer. Methods for forming the doped surfaces involve gas-phase doping exposed surfaces of the base material in situ, within a same material-removal tool used to form at least one opening defined at least partially by the base material and into which the dopant is to be introduced.