The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 10, 2021

Filed:

Jan. 29, 2020
Applicant:

Jeol Ltd., Tokyo, JP;

Inventors:

Shigeyuki Morishita, Tokyo, JP;

Izuru Chiyo, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/222 (2013.01); H01J 37/28 (2013.01); H01J 2237/1532 (2013.01); H01J 2237/2802 (2013.01);
Abstract

In a scanning transmission electron microscope, a control unit performs: processing of calculating a first auto-correlation function that is an auto-correlation function of a first scanning transmission electron microscope image; processing of acquiring a first intensity profile along a straight line that passes through a center of the first auto-correlation function; processing of obtaining a position of an inflection point that is closest to the center of the first auto-correlation function in the first intensity profile and adopting an intensity at the position as a first reference intensity; processing of obtaining an aberration coefficient by fitting a first aberration function to an isointensity line that connects positions where intensity is equal to the first reference intensity in the first auto-correlation function and by fitting a second aberration function to an isointensity line that connects positions where intensity is equal to a second reference intensity in a second auto-correlation function; and processing of controlling an electron optical system based on the aberration coefficient.


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