The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2021
Filed:
Jul. 22, 2020
International Business Machines Corporation, Armonk, NY (US);
Hua Xiang, Ossining, NY (US);
Gi-Joon Nam, Chappaqua, NY (US);
Gustavo Enrique Tellez, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Techniques for dynamically generating self-aligned double patterning (SADP) gate regions based on gate distribution and the relocation of the gates to their matched region are provided. In one aspect, a method for generating SADP gate regions in a circuit design includes: obtaining a circuit design having SADP gates, and a placement solution for the SADP gates that, while non-overlapping, violates SADP track routing matching requirements; determining approximate locations of SADP regions in the circuit design; assigning the SADP gates to the SADP regions using a minimum-cost maximum-flow (min-cost max-flow) process; and identifying, once all of the SADP gates have been assigned to the SADP regions, non-overlapping locations for the SADP gates in the SADP regions.