The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2021
Filed:
Jul. 17, 2019
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Peter Huber, Heidenheim, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, having a mirror substrate (), a reflection layer (), which is configured to have a reflectivity of at least 50% for electromagnetic radiation of a predefined operating wavelength that is incident on the optically effective surface () of the mirror at an angle of incidence of at least 65° relative to the respective surface normal, and a barrier layer system (), which is arranged between the reflection layer and the mirror substrate and has a sequence of alternating layer plies composed of a first material and at least one second material. The barrier layer system reduces penetration of hydrogen atoms that would otherwise penetrate the mirror substrate by at least a factor of 10.