The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2021

Filed:

Apr. 20, 2020
Applicant:

Gigaphoton Inc., Tochigi, JP;

Inventors:

Natsushi Suzuki, Oyama, JP;

Osamu Wakabayashi, Oyama, JP;

Hiroaki Tsushima, Oyama, JP;

Masanori Yashiro, Oyama, JP;

Assignee:

Gigaphoton Inc., Tochigi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/036 (2006.01); H01S 3/104 (2006.01); H01S 3/225 (2006.01); B01D 53/34 (2006.01); B01D 53/82 (2006.01); H01S 3/23 (2006.01); B01D 53/04 (2006.01); B01D 53/68 (2006.01); B01D 53/86 (2006.01);
U.S. Cl.
CPC ...
H01S 3/036 (2013.01); B01D 53/0446 (2013.01); B01D 53/346 (2013.01); B01D 53/685 (2013.01); B01D 53/82 (2013.01); B01D 53/86 (2013.01); H01S 3/104 (2013.01); H01S 3/225 (2013.01); H01S 3/2366 (2013.01); B01D 2251/404 (2013.01); B01D 2251/602 (2013.01); B01D 2253/108 (2013.01); B01D 2255/20753 (2013.01); B01D 2255/20761 (2013.01); B01D 2257/2027 (2013.01); B01D 2258/0216 (2013.01); B01D 2259/40003 (2013.01);
Abstract

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.


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