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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11081377 B1

PDFFull Text
Date of Patent:
Aug. 03, 2021

Filed:

Oct. 10, 2019

Substrate processing system

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Ryota Goto, Nirasaki, JP;

Kiyoshi Suzuki, Nirasaki, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Tanya E. Harkins

Primary Examiner:

Seahvosh Nikmanesh

Int. Cl.
CPC ...
B65G 49/07 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); B65G 49/07 (2013.01); H01L 21/6773 (2013.01); H01L 21/67259 (2013.01); H01L 21/67781 (2013.01); H01L 21/68742 (2013.01); H01L 21/67161 (2013.01); H01L 21/67167 (2013.01); H01L 21/67196 (2013.01); H01L 21/67201 (2013.01); H01L 21/67742 (2013.01); H01L 21/67745 (2013.01); H01L 21/67754 (2013.01);
Abstract

A substrate processing system comprising: a first chamber comprising loading tables, on which a plurality of substrates are to be loaded; a second chamber comprising loading tables, on which a plurality of substrates are to be loaded; a first transfer device comprising a plurality of blades configured to hold a plurality of substrates in a lengthwise direction thereof, and configured to transfer a plurality of substrates loaded on the loading tables of the first chamber to the loading tables of the second chamber with the substrates held at the same height; a substrate sensor provided on paths, along which the blades enter the second chamber, and configured to detect a substrate held by the blades; and a controller configured to control the first transfer device.

Find Patent Forward Citations

Goto, Ryota. (2021). Substrate processing system (U.S. Patent No. 11081377). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11081377

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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