The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2021

Filed:

Aug. 12, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Wei-Lin Chu, Hsinchu County, TW;

Hsin-Lun Tseng, Taoyuan, TW;

Sheng-Wen Huang, Hsinchu, TW;

Chih-Chung Huang, Hsinchu, TW;

Chi-Ming Tsai, Taipei, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/30 (2020.01); G03F 1/70 (2012.01); G03F 1/36 (2012.01); G03F 1/22 (2012.01); G03F 7/20 (2006.01); G06N 20/00 (2019.01); G06F 30/392 (2020.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G03F 1/22 (2013.01); G03F 1/36 (2013.01); G03F 7/2004 (2013.01); G06F 30/392 (2020.01); G06N 20/00 (2019.01);
Abstract

A method and a system of performing layout enhancement include: providing a first design layout comprising a plurality of cells; updating a first cell in the plurality of cells using optical proximity correction to provide a first updated cell and a data set; updating a second cell from remaining cells in the first design layout based on the data set to provide a second updated cell; and manufacturing a mask based on the first updated cell and the second updated cell in the first design layout.


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