The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2021
Filed:
Apr. 12, 2019
Intel Corporation, Santa Clara, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
An apparatus, method, and computer readable medium to accommodate depth noise in SLAM (Simultaneous Localization & Mapping). The method includes receiving correspondences and clusters for pose estimation. After the correspondences and clusters are received, a dynamic centroid is determined using 3-D features of a landmark. The 3-D features of the landmark comprise a cluster. Next, distance-error metrics are determined using the dynamic centroid, a map point, and the cluster. The distance-error metrics are compared with thresholds to remove depth noise affected 3-D features and landmarks when the distance-error metrics are larger than the thresholds. The remaining 3-D features of the cluster are sent to a pose estimation framework.