The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 27, 2021

Filed:

Mar. 21, 2019
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Yasuhiro Shiba, Kyoto, JP;

Bingxi Liu, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 25/00 (2006.01); F27B 17/00 (2006.01); C23C 16/46 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
F27B 17/0025 (2013.01); C23C 16/46 (2013.01); H01L 21/67109 (2013.01);
Abstract

Disclosed is a substrate treating apparatus with a baking unit for heating a substrate to which a treating liquid that generates sublimate through heating is applied to bake a surface of the substrate to form a coat film. The apparatus includes the following elements: a first bake group, a second bake group, a first exhaust pipe that forms a flow path of exhaust gases from the first bake group with its end being in fluid communication with an exhaust gas processor that processes the exhaust gases, a second exhaust pipe that forms a flow path of exhaust gases from the second bake group, and a junction provided at a midstream of the first exhaust pipe and in fluid communication with a downstream side of the second exhaust pipe.


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