The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Aug. 29, 2017
Applicant:

Qorvo Us, Inc., Greensboro, NC (US);

Inventors:

Peter J. Zampardi, Newbury Park, CA (US);

Brian G. Moser, Jamestown, NC (US);

Denny Limanto, Jamestown, NC (US);

Assignee:

Qorvo US, Inc., Greensboro, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H01L 27/07 (2006.01); H01L 29/06 (2006.01); H01L 29/778 (2006.01); H01L 29/732 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 29/66 (2006.01); H01L 27/06 (2006.01); H01L 29/417 (2006.01); H01L 21/8252 (2006.01); H01L 29/205 (2006.01); H01L 29/812 (2006.01); H01L 29/737 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0705 (2013.01); H01L 21/8252 (2013.01); H01L 27/0207 (2013.01); H01L 27/0605 (2013.01); H01L 27/0623 (2013.01); H01L 29/0642 (2013.01); H01L 29/0821 (2013.01); H01L 29/0843 (2013.01); H01L 29/1033 (2013.01); H01L 29/1058 (2013.01); H01L 29/41708 (2013.01); H01L 29/6631 (2013.01); H01L 29/732 (2013.01); H01L 29/7786 (2013.01); H01L 29/7787 (2013.01); H01L 29/0804 (2013.01); H01L 29/0891 (2013.01); H01L 29/1004 (2013.01); H01L 29/205 (2013.01); H01L 29/66318 (2013.01); H01L 29/7371 (2013.01); H01L 29/812 (2013.01);
Abstract

A logic gate cell structure is disclosed. The logic gate cell structure includes a substrate, a channel layer disposed over the substrate, and a field-effect transistor (FET) contact layer disposed over the channel layer. The FET contact layer is divided by an isolation region into a single contact region and a combined contact region. The channel layer and the FET contact layer form part of a FET device. A collector layer is disposed within the combined contact region over the FET contact layer to provide a current path between the channel layer and the collector layer though the FET contact layer. The collector layer, a base layer, and an emitter layer form part of a bipolar junction transistor.


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