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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11069546 B1

PDFFull Text
Date of Patent:
Jul. 20, 2021

Filed:

Apr. 05, 2016

Substrate processing system

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Yoshifumi Amano, Koshi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

Pearne & Gordon LLP

Primary Examiner:

Matthew J Song

Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01); H01L 21/677 (2006.01); H01L 21/673 (2006.01); H01L 21/683 (2006.01); B08B 1/00 (2006.01); B08B 11/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67178 (2013.01); H01L 21/673 (2013.01); H01L 21/67167 (2013.01); H01L 21/67184 (2013.01); H01L 21/67742 (2013.01); H01L 21/67745 (2013.01); H01L 21/6838 (2013.01); H01L 21/68707 (2013.01); B08B 1/002 (2013.01); B08B 11/02 (2013.01);
Abstract

A substrate processing system includes a first processing block, a second processing block, and a reversing device. The first processing block includes a first processing unit configured to perform a process on a substrate with a first surface of the substrate facing upward, and a first transfer device configured to carry the substrate into/from the first processing unit. The second processing block includes a second processing unit configured to perform a process on the substrate with a second surface of the substrate, which is opposite to the first surface, facing upward, and a second transfer device configured to carry the substrate into/from the second processing unit. The reversing device is provided on a transfer path of the substrate from the first processing block to the second processing block, and is configured to reverse the substrate.

Find Patent Forward Citations

Amano, Yoshifumi. (2021). Substrate processing system (U.S. Patent No. 11069546). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11069546

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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