The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2021
Filed:
Feb. 04, 2020
Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);
Matthew C. Putman, Brooklyn, NY (US);
John B. Putman, Celebration, FL (US);
Vadim Pinskiy, Wayne, NJ (US);
Damas Limoge, Brooklyn, NY (US);
Andrew Sundstrom, Brooklyn, NY (US);
James Williams, III, New York, NY (US);
Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);
Abstract
A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.