The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2021
Filed:
Jul. 24, 2019
Fuji Electric Co., Ltd., Kawasaki, JP;
FUJI ELECTRIC CO., LTD., Kawasaki, JP;
Abstract
At an upper surface of a gate electrode, a recess occurs due to etching back of poly-silicon for forming the gate electrode. At an upper surface of an interlayer insulating film, a recess occurs in a portion that opposes in a depth direction, the recess of the upper surface of the gate electrode. A barrier metal includes sequentially stacked first to fourth metal films. The first metal film is a titanium nitride film that covers the surface of the interlayer insulating film and has an opening that exposes the recess of the upper surface of the interlayer insulating film. The second metal film is a titanium film that covers the first metal film and the source electrode, and is in contact with the interlayer insulating film, in the opening of the first metal film. The third and fourth metal films are a titanium nitride film and a titanium film, respectively.