The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2021
Filed:
Jul. 21, 2020
Applicant:
D2s, Inc., San Jose, CA (US);
Inventors:
Akira Fujimura, Saratoga, CA (US);
Harold Robert Zable, Palo Alto, CA (US);
Nagesh Shirali, San Jose, CA (US);
William E. Guthrie, Santa Clara, CA (US);
Ryan Pearman, San Jose, CA (US);
Assignee:
D2S, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/302 (2006.01); H01J 37/317 (2006.01); G03F 1/36 (2012.01); G03F 7/20 (2006.01); G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
H01J 37/3026 (2013.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 7/2061 (2013.01); H01J 37/3177 (2013.01); H01J 2237/31761 (2013.01); H01J 2237/31771 (2013.01); H01J 2237/31774 (2013.01); H01J 2237/31776 (2013.01);
Abstract
A method for exposing a pattern in an area on a surface using a charged particle beam system is disclosed and includes determining a local pattern density for the area of the pattern based on an original set of exposure information. A pre-PEC maximum dose is determined for the area. The original set of exposure information is modified with the pre-PLC maximum dose.