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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11061329 B1

PDFFull Text
Date of Patent:
Jul. 13, 2021

Filed:

Oct. 29, 2018

Resist composition, method of forming resist pattern, polymeric compound, and compound

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Takuya Ikeda, Kawasaki, JP;

Masatoshi Arai, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/30 (2006.01); C07C 69/54 (2006.01); C07C 69/593 (2006.01); C07C 69/753 (2006.01); C08F 220/18 (2006.01); C08F 222/14 (2006.01); C08F 222/18 (2006.01); C08F 222/20 (2006.01); G03F 7/004 (2006.01); C08L 67/04 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C07C 69/54 (2013.01); C07C 69/593 (2013.01); C07C 69/753 (2013.01); C08F 220/1806 (2020.02); C08F 220/1807 (2020.02); C08F 220/1808 (2020.02); C08F 220/1809 (2020.02); C08F 220/1811 (2020.02); C08F 222/14 (2013.01); C08F 222/145 (2020.02); C08F 222/18 (2013.01); C08F 222/185 (2020.02); C08F 222/20 (2013.01); C08F 222/205 (2020.02); G03F 7/0045 (2013.01); G03F 7/30 (2013.01); C08L 67/04 (2013.01);
Abstract

A resist composition including a resin component having a structural unit derived form a compound represented by formula (a0-1) (in the formula, W represents a polymerizable group-containing group; Rais a group which is bonded to Rato form an aliphatic cyclic group, or bonded to Rato form an aliphatic cyclic group; Rarepresents a hydrocarbon group which may have a substituent; Rais a hydrogen atom or a monovalent organic group in the case where Rais not bonded thereto; Rais a hydrogen atom or a monovalent organic group in the case where Rais not bonded thereto; and Rato Raeach independently represents a hydrogen atom or a monovalent organic group).

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