The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2021
Filed:
Jun. 24, 2019
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Yann Astier, Irvington, NY (US);
David Esteban, Poughkeepsie, NY (US);
Judson R. Holt, Wappingers Falls, NY (US);
Henry K. Utomo, Newburgh, NY (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C12M 3/00 (2006.01); C12M 1/00 (2006.01); B01L 3/00 (2006.01); G01N 1/40 (2006.01); A61L 2/02 (2006.01); C09D 5/16 (2006.01);
U.S. Cl.
CPC ...
G01N 1/405 (2013.01); A61L 2/02 (2013.01); B01L 3/502707 (2013.01); B01L 3/502761 (2013.01); C09D 5/1681 (2013.01); B01L 2200/0668 (2013.01); B01L 2300/0816 (2013.01); B01L 2300/0864 (2013.01); B01L 2300/0893 (2013.01);
Abstract
A device for isolating a microbe or a virion includes a semiconductor substrate; and a trench formed in the semiconductor substrate and extending from a surface of the semiconductor substrate to a region within the semiconductor substrate; wherein the trench has dimensions such that the microbe or the virion is trapped within the trench.