The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2021

Filed:

Aug. 30, 2017
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Chiyu Zhu, Helsinki, FI;

Kiran Shrestha, Phoenix, AZ (US);

Qi Xie, Leuven, BE;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C23C 16/455 (2006.01); C23C 16/04 (2006.01); C23C 16/08 (2006.01); C23C 16/02 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28562 (2013.01); C23C 16/0281 (2013.01); C23C 16/045 (2013.01); C23C 16/08 (2013.01); C23C 16/45527 (2013.01); H01L 21/28568 (2013.01); H01L 21/28079 (2013.01);
Abstract

There is provided a method of forming a layer, comprising depositing a seed layer on the substrate and depositing a bulk layer on the seed layer. Depositing the seed layer comprises supplying a first precursor comprising metal and halogen atoms to the substrate; and supplying a first reactant to the substrate. Depositing the bulk layer comprises supplying a second precursor comprising metal and halogen atoms to the seed layer and supplying a second reactant to the seed layer.


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