The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2021

Filed:

Jan. 07, 2020
Applicant:

Mec Company Ltd., Hyogo, JP;

Inventor:

Keisuke Matsumoto, Hyogo, JP;

Assignee:

MEC COMPANY LTD., Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/00 (2006.01); C23F 1/18 (2006.01); H05K 3/38 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
C23F 1/18 (2013.01); H01L 21/32134 (2013.01); H05K 3/383 (2013.01); H05K 2203/0307 (2013.01); H05K 2203/0776 (2013.01); H05K 2203/0789 (2013.01);
Abstract

Disclosed are: a microetching agent which can form roughened shapes less affected by differences in the crystallinity of the copper and with which roughened shape excellent in terms of adhesiveness to resins, etc. can be formed on either electrolytic copper or rolled copper; and a method for producing a wiring board which includes a step of roughening a copper surface using the microetching agent. In the present invention, the microetching agent for copper is an acidic aqueous solution containing an inorganic acid, a cupric ion source, a halide ion source, and a polymer. The polymer has a functional group containing a nitrogen atom. It is preferable that the microetching agent contain a sulfate ion source.


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