The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2021
Filed:
Sep. 26, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Rohit Mishra, Santa Clara, CA (US);
Siva Suri Chandra Rao Bhesetti, Singapore, SG;
Eng Sheng Peh, Singapore, SG;
Sriskantharajah Thirunavukarasu, Singapore, SG;
Shoju Vayyapron, Bangalore, IN;
Cheng Sun, Singapore, SG;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/50 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/50 (2013.01); C23C 16/45565 (2013.01); H01J 37/3244 (2013.01);
Abstract
A nozzle for uniform plasma processing comprises an inlet portion and an outlet portion. The inlet portion has a side surface substantially parallel to a vertical axis. The inlet portion comprises a plurality of gas channels. The outlet portion is coupled to the inlet portion. The outlet portion comprises a plurality of outlets. At least one of the outlets is at an angle other than a right angle relative to the vertical axis.