The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2021
Filed:
Feb. 21, 2018
Applicant:
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Inventors:
Kevin Anglin, Somerville, MA (US);
Maureen Petterson, Salem, MA (US);
Assignee:
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); H01L 21/285 (2006.01); H01L 21/02 (2006.01); C23C 14/34 (2006.01); C23C 14/06 (2006.01); C23C 14/16 (2006.01); C23C 14/46 (2006.01); C23C 14/22 (2006.01);
U.S. Cl.
CPC ...
C23C 14/048 (2013.01); C23C 14/04 (2013.01); C23C 14/0605 (2013.01); C23C 14/16 (2013.01); C23C 14/225 (2013.01); C23C 14/3442 (2013.01); C23C 14/3471 (2013.01); C23C 14/46 (2013.01); H01L 21/02115 (2013.01); H01L 21/02266 (2013.01); H01L 21/2855 (2013.01);
Abstract
A method includes providing a substrate, where the substrate has a patterned substrate surface, wherein the patterned substrate surface comprises a first surface region and a second surface region. The method may also include directing a depositing species to the patterned substrate surface; and directing angled ions to the patterned substrate surface, wherein the depositing species forms a deposit on the first surface region and does not form a deposit on the second surface region.