The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2021

Filed:

Dec. 06, 2017
Applicant:

Hitachi Chemical Company, Ltd., Tokyo, JP;

Inventors:

Aya Kasahara, Tokyo, JP;

Toshihisa Nonaka, Tokyo, JP;

Daisuke Fujimoto, Tokyo, JP;

Naoya Suzuki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 21/56 (2006.01); H01L 23/29 (2006.01); H01L 23/31 (2006.01);
U.S. Cl.
CPC ...
H01L 24/03 (2013.01); H01L 21/561 (2013.01); H01L 21/568 (2013.01); H01L 23/293 (2013.01); H01L 23/3128 (2013.01); H01L 24/05 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/04105 (2013.01);
Abstract

A method for producing a semiconductor device of the present invention includes: step (I) of disposing one or more semiconductor elements each having an active surface, on a thermosetting resin film containing a thermosetting resin composition, such that the thermosetting resin film and the active surfaces of the semiconductor elements come into contact; step (II) of encapsulating the semiconductor elements disposed on the thermosetting resin film with a member for semiconductor encapsulation; step (III) of providing openings in the thermosetting resin film or a cured product thereof after step (II), the openings extending to the active surfaces of the semiconductor elements; and step (IV) of filling the openings with a conductor or forming a conductor layer inside the openings.


Find Patent Forward Citations

Loading…