The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2021
Filed:
Aug. 15, 2019
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Byung-Jin Choi, Austin, TX (US);
Seth J. Bamesberger, Austin, TX (US);
Masaki Saito, Austin, TX (US);
Ozkan Ozturk, Round Rock, TX (US);
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); H01L 21/683 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68785 (2013.01); H01L 21/31051 (2013.01); H01L 21/6838 (2013.01);
Abstract
A method, comprising retaining a superstrate with a superstrate chuck; applying a pressure to deflect the superstrate toward a substrate, deflection of the superstrate being gradually extended along a radial direction; maintaining a vacuum applied to a perimeter of the superstrate and continuously retaining the superstrate with the chuck while the deflecting the superstrate by the pressure; releasing the vacuum from the perimeter of the superstrate; and releasing the superstrate from the chuck.