The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2021

Filed:

Jan. 24, 2017
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

James D. Carducci, Sunnyvale, CA (US);

Kenneth S. Collins, San Jose, CA (US);

Kartik Ramaswamy, San Jose, CA (US);

Michael R. Rice, Pleasanton, CA (US);

Richard Charles Fovell, San Jose, CA (US);

Vijay D. Parkhe, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32009 (2013.01); H01J 37/3244 (2013.01); H01J 37/3255 (2013.01); H01J 2237/334 (2013.01);
Abstract

A gas distribution plate assembly for a processing chamber is provided that in one embodiment includes a body made of a metallic material, a base plate comprising a silicon infiltrated metal matrix composite coupled to the body, and a perforated faceplate comprising a silicon disk coupled to the base plate by a bond layer.


Find Patent Forward Citations

Quick Actions:

Carducci, James. (2021). Gas distribution plate assembly for high power plasma etch processes (U.S. Patent No. 11043360). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11043360

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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