The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Mar. 12, 2019
Micron Technology, Inc., Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Some embodiments include a method of patterning a target material. An assembly is provided which has a masking material over the target material. First lines are formed over the assembly. The first lines extend along a first direction and are laterally spaced from one another by first spaces. Second lines are formed over the first lines. The second lines extend along a second direction which crosses the first direction, and are laterally spaced from one another by second spaces. The second lines cross the first lines at first crossing regions. The second spaces cross the first spaces at second crossing regions. A pattern includes the first and second crossing regions. The pattern is transferred into the masking material to form holes in the masking material in locations directly under the first and second crossing regions. The holes are extended into the target material.