The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Nov. 11, 2019
Globalfoundries U.s. Inc., Santa Clara, CA (US);
Richard P. Good, Saratoga Springs, NY (US);
Ian R. Krumanocker, Troy, NY (US);
GLOBALFOUNDRIES U.S. INC., Santa Clara, CA (US);
Abstract
The present disclosure generally relates to semiconductor structures and, more particularly, to overlay optimization and methods of manufacture. The method includes performing, by a computing device, an exposure with a correction parameter to a first wafer; performing, by the computing device, a decorrection of the correction parameter; collecting, by the computing device, overlay data in response to the exposure and the decorrection; estimating, by the computing device, an optimal parameter from the overlay data; and applying, by the computing device, the optimal parameter to a second wafer to align an overlay in the second wafer.