The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Apr. 15, 2020
Applicant:
Gigaphoton Inc., Tochigi, JP;
Inventor:
Atsushi Ueda, Oyama, JP;
Assignee:
Gigaphoton Inc., Tochigi, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70033 (2013.01); G03F 7/70041 (2013.01); H05G 2/006 (2013.01); H05G 2/008 (2013.01);
Abstract
An extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target with a pulse laser beam includes: a chamber; a magnet that is positioned outside the chamber and forms a magnetic field () inside the chamber; a discharge path () that is opened at a position on an inner wall surface of the chamber where the inner wall surface intersects a central axis of the magnetic field () and through which gas inside the chamber is discharged; and a gas supply unit () configured to supply gas into the discharge path () through an inner wall surface of the discharge path.