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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11036134 B1

PDFFull Text
Date of Patent:
Jun. 15, 2021

Filed:

Oct. 12, 2017

High etch resistance spin-on carbon hard mask composition and patterning method using same

Applicant:

Young Chang Chemical Co., Ltd, Gyeongsangbuk-do, KR;

Inventors:

Gi Hong Kim, Daegu, KR;

Su Jin Lee, Daegu, KR;

Seung Hyun Lee, Daegu, KR;

Seung Hun Lee, Daegu, KR;

Assignee:

YOUNG CHANG CHEMICAL CO., LTD, Gyeongsangbuk-Do, KR;

Attorneys:

Novick, Kim & Lee, PLLC

Jae Youn Kim

Primary Examiner:

John A McPherson

Assistant Examiner:

Richard David Champion

Int. Cl.
CPC ...
C08G 61/12 (2006.01); G03F 7/004 (2006.01); C08G 61/10 (2006.01); G03F 7/16 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0048 (2013.01); C08G 61/10 (2013.01); C08G 61/124 (2013.01); G03F 7/094 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01);
Abstract

Provided is a hard mask composition having high etching resistance suitable for use in a semiconductor lithography process, and particularly to a spin-on hard mask composition including a dibenzo carbazole polymer and to a patterning method of forming a hard mask layer by applying the composition on an etching layer through spin coating and performing a baking process. The hard mask according to the present invention has effects of exhibiting high solubility and superior mechanical properties, as well as high etching resistance to withstand multiple etching processes.

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Kim, Gi. (2021). High etch resistance spin-on carbon hard mask composition and patterning method using same (U.S. Patent No. 11036134). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11036134

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